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Siddharth Doshi; Dominik Ludescher; Julian Karst; Moritz Floess; Johan Carlström; Bohan Li; Nofar Mintz Hemed; Yi-Shiou Duh; Nicholas A Melosh; Mario Hentschel; Mark Brongersma; Harald Giessen
Direct electron beam patterning of electro-optically active PEDOT: PSS Journal Article
In: Nanophotonics, no. 0, 2024.
@article{doshi2024direct,
title = {Direct electron beam patterning of electro-optically active PEDOT: PSS},
author = {Siddharth Doshi and Dominik Ludescher and Julian Karst and Moritz Floess and Johan Carlstr\"{o}m and Bohan Li and Nofar Mintz Hemed and Yi-Shiou Duh and Nicholas A Melosh and Mario Hentschel and Mark Brongersma and Harald Giessen},
doi = {10.1515/nanoph-2023-0640},
year = {2024},
date = {2024-01-04},
urldate = {2023-09-12},
journal = {Nanophotonics},
number = {0},
abstract = {The optical and electronic tunability of the conductive polymer poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) has enabled emerging applications as diverse as bioelectronics, flexible electronics, and micro- and nano-photonics. High-resolution spatial patterning of PEDOT:PSS opens up opportunities for novel active devices in a range of fields. However, typical lithographic processes require tedious indirect patterning and dry etch processes, while solution-processing methods such as ink-jet printing have limited spatial resolution. Here, we report a method for direct write nano-patterning of commercially available PEDOT:PSS through electron-beam induced solubility modulation. The written structures are water stable and maintain the conductivity as well as electrochemical and optical properties of PEDOT:PSS, highlighting the broad utility of our method. We demonstrate the potential of our strategy by preparing prototypical nano-wire structures with feature sizes down to 250 nm, an order of magnitude finer than previously reported direct write methods, opening the possibility of writing chip-scale microelectronic and optical devices. We finally use the high-resolution writing capabilities to fabricate electrically-switchable optical diffraction gratings. We show active switching in this archetypal system with >95 % contrast at CMOS-compatible voltages of +2 V and −3 V, offering a route towards highly-miniaturized dynamic optoelectronic devices.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
The optical and electronic tunability of the conductive polymer poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) has enabled emerging applications as diverse as bioelectronics, flexible electronics, and micro- and nano-photonics. High-resolution spatial patterning of PEDOT:PSS opens up opportunities for novel active devices in a range of fields. However, typical lithographic processes require tedious indirect patterning and dry etch processes, while solution-processing methods such as ink-jet printing have limited spatial resolution. Here, we report a method for direct write nano-patterning of commercially available PEDOT:PSS through electron-beam induced solubility modulation. The written structures are water stable and maintain the conductivity as well as electrochemical and optical properties of PEDOT:PSS, highlighting the broad utility of our method. We demonstrate the potential of our strategy by preparing prototypical nano-wire structures with feature sizes down to 250 nm, an order of magnitude finer than previously reported direct write methods, opening the possibility of writing chip-scale microelectronic and optical devices. We finally use the high-resolution writing capabilities to fabricate electrically-switchable optical diffraction gratings. We show active switching in this archetypal system with >95 % contrast at CMOS-compatible voltages of +2 V and −3 V, offering a route towards highly-miniaturized dynamic optoelectronic devices.
